Toggle Dropdown
Groups
Announcements
Projects
Ideas
Welcome guest
Log in
Practice
My Requests
All Requests
Drill Partners
Digital games
Projects
Goals
Loading
Loading...
0
0
Huawei confirms breakthrough in EUV lithography process optimization - DIGITIMES
12/26/22 at 12:29am
Organization
Digitimes
Authors
Judy Lin
DIGITIMES Asia
Taipei
46 words
0
Comments
Huawei has confirmed in a posting on its website reports about its breakthrough in making a light source component used in EUV lithography systems which are required for making high-end processors on sub-10 nm nodes.
Computers & Electronics
technology
Business & Industrial
News
Science
EUV lithography process optimization
source component
website reports
DIGITIMES
You are the first to view
https://www.digitimes.com/news/a20221226VL203/euv-huawei.html
Create an account
or
login
to join the discussion
Modal title
...
Profile
Loading profile
Loading...