https://semiengineering.com/new-low-temp-growth-fabrication-technology-allowing-integration-of-2d-materials-directly-onto-a-silicon-circuit-mit/
0
0
New Low-Temp Growth & Fabrication Technology Allowing Integration of 2D Materials Directly Onto A Silicon Circuit (MIT) - SemiEngineering
5/5/23 at 8:45pm
Organization
SemiEngineering
Author
Technical Paper Link
Details
56 words
Summarize
Business & Industrial Science Growth & Fabrication Technology Allowing Integration of 2D Materials Directly Onto A Silicon Circuit MIT monolayer molybdenum disulfide silicon back-end Oak Ridge National Laboratory
A new technical paper titled “Low-thermal-budget synthesis of monolayer molybdenum disulfide for silicon back-end-of-line integration on a 200 mm platform” was published by researchers at MIT, Oak Ridge National Laboratory, and... » read more
Create an account or login to join the discussion